File:Defocus pattern shift vs wavelength.png
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Summary
| Description | Due to the multilayer reflectance vs angle being different for different wavelengths, the line pattern shifts differently for different wavelengths when defocused.refChromatic Blur in EUV Lithography</ref>refF. Scholze et al., Proc. SPIE 6151, 615137 (2006).</ref>refIllumination Rotation in Ring-Field Optics in Reflective Lithography Systems</ref> |
| Date | |
| Source | Excel |
| Author | Guiding light |
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| Date/Time | Dimensions | User | Comment |
|---|---|---|---|
| 2020-01-10 16:13:55 | 591 × 297 | Guiding light | Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]] |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 15:57, 2 April 2020 | | 591 × 297 (20 KB) | Hippymoose17 | Transferred from en.wikipedia (MTC!) (1.1.0) |
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